[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Ni/Co/Ni/TiN structure for highly thermal immune NiSi for CMOSFETs application
Soon-Young Oh,, Jang-Gn Yun,, Yong-Jin Kim,, Won-Jae Lee,, Agchbayar Tuya,, Hee-Hwan Ji,, Ui-Sik Kim,, Han-Seob Cha,, Sang-Bum Heo,, Jeong-Gun Lee,, Gil-Jin Han,, Yoo Jeong Cho,, Yeong CheYear:
2005
Language:
english
DOI:
10.1109/iwjt.2005.203891
File:
PDF, 1.46 MB
english, 2005