[IEEE 2005 International Conference On Simulation of Semiconductor Processes and Devices - Tokyo, Japan (2005.09.3-2005.09.3)] 2005 International Conference On Simulation of Semiconductor Processes and Devices - A Unified Statistical Model for Inter-Die and Intra-Die Process Variation
Ji-Seong Doh,, Dae-Wook Kim,, Sang-Hoon Lee,, Jong-Bae Lee,, Young-kwan Park,, Moon-Hyun Yoo,, Jeong-Taek Kong,Year:
2005
Language:
english
DOI:
10.1109/sispad.2005.201490
File:
PDF, 1.05 MB
english, 2005