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[IEEE 2010 IEEE International Reliability Physics Symposium - Garden Grove (Anaheim), CA, USA (2010.05.2-2010.05.6)] 2010 IEEE International Reliability Physics Symposium - Effect of pre-existing void in sub-30nm Cu interconnect reliability
Choi, Zungsun, Tsukasa, Matsuda, Lee, Jong Myeong, Choi, Gil-Heyun, Choi, Siyoung, Moon, Joo-TaeYear:
2010
Language:
english
DOI:
10.1109/irps.2010.5488708
File:
PDF, 629 KB
english, 2010