Effect of Process Pressure on Atomic Layer Deposition of...

Journal of The Electrochemical Society 2007 Vol. 154; Iss. 11

Effect of Process Pressure on Atomic Layer Deposition of Al[sub 2]O[sub 3]

Li, Ming-Yen, Chang, Yung-Yuan, Wu, Hsiao-Che, Huang, Cheng-Sung, Chen, Jen-Chung, Lue, Jen-Lang, Chang, Shieh-Ming
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Volume:
154
Year:
2007
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2778861
File:
PDF, 728 KB
english, 2007
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