Impacts of Cu Contamination on Device Reliabilities in 3-D IC Integration
Kang-Wook Lee,, Ji-Chel Bea,, Ohara, Yuki, Murugesan, Mariappan, Fukushima, Takafumi, Tanaka, Tetsu, Koyanagi, MitsumasaVolume:
14
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2013.2258022
Date:
March, 2014
File:
PDF, 2.26 MB
english, 2014