Effects of High-$\kappa$ (HfO$_2$) Gate Dielectrics in Double-Gate and Cylindrical-Nanowire FETs Scaled to the Ultimate Technology Nodes
Gnani, Elena, Reggiani, Susanna, Rudan, Massimo, Baccarani, GiorgioVolume:
6
Language:
english
Journal:
IEEE Transactions On Nanotechnology
DOI:
10.1109/tnano.2006.888547
Date:
January, 2007
File:
PDF, 1.40 MB
english, 2007