Rapid thermal annealing of cerium dioxide thin films...

Materials Science in Semiconductor Processing 2015 / 02 Vol. 30

Rapid thermal annealing of cerium dioxide thin films sputtered onto silicon (111) substrates: Influence of heating rate on microstructure and electrical properties

Guhel, Y., Toloshniak, T., Bernard, J., Besq, A., Germanicus, R. Coq, El Fallah, J., Pesant, J.C., Descamps, P., Boudart, B.
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Volume:
30
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2014.10.010
Date:
February, 2015
File:
PDF, 6.40 MB
english, 2015
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