Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
Li, Zhengwen, Rahtu, Antti, Gordon, Roy G.Volume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2338632
File:
PDF, 1.13 MB
english, 2006