[IEEE The 17th Annual SEMI/IEEE ASMC 2006 Conference - Boston, MA (May 22-24, 2006)] The 17th Annual SEMI/IEEE ASMC 2006 Conference - STI Gap-Fill Technology with High Aspect Ratio Process for 45nm CMOS and beyond
Tilke, A.T., Culmsee, M., Jaiswal, R., Hampp, R., Conti, R., Galiano, M., Stapelmann, C., Wille, W., Jain, A.Year:
2006
Language:
english
DOI:
10.1109/asmc.2006.1638726
File:
PDF, 486 KB
english, 2006