[IEEE [1993 International Workshop on VLSI Process and...

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[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - 2D Process Simulation With Accurate Dopant And Stress Profiles Calculations

Collard, D., Senez, V., Baccus, B.
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Year:
1993
Language:
english
DOI:
10.1109/vpad.1993.724735
File:
PDF, 386 KB
english, 1993
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