Ti quadlevel resist process for the fabrication of Nb SIS junctions
Clark, W.W., Zhang, J.Z., Lichtenberger, A.W.Volume:
13
Language:
english
Journal:
IEEE Transactions on Appiled Superconductivity
DOI:
10.1109/tasc.2003.813659
Date:
June, 2003
File:
PDF, 659 KB
english, 2003