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[IEEE The 17th Annual SEMI/IEEE ASMC 2006 Conference - Boston, MA (May 22-24, 2006)] The 17th Annual SEMI/IEEE ASMC 2006 Conference - Deep Trench Resistance and leakage Reduction -- Poly1 Doping Process Optimization in High Volume DRAM Manufacturing for 300mm Factory
Min-Soo Kim,, Cooper, W., Simonson, B., Ricks, D., McDaniel, E., Miller, R., Chapman, R., Taylor, T., Fuller, R.Year:
2006
Language:
english
DOI:
10.1109/asmc.2006.1638795
File:
PDF, 3.96 MB
english, 2006