Physical-Based Threshold Voltage and Mobility Models Including Shallow Trench Isolation Stress Effect on nMOSFETs
Wu, Wei, Du, Gang, Liu, Xiaoyan, Sun, Lei, Kang, Jinfeng, Han, RuqiVolume:
10
Language:
english
Journal:
IEEE Transactions on Nanotechnology
DOI:
10.1109/tnano.2010.2089468
Date:
July, 2011
File:
PDF, 416 KB
english, 2011