[IEEE 2007 International Workshop on Junction Technology - Kyoto, Japan (2007.06.8-2007.06.9)] 2007 International Workshop on Junction Technology - Formation of Shallow Junctions Using Ge-Si Heterostructures for High Mobility Channel MOSFETs
Oh, Jungwoo, Majhi, Prashant, Lee, Hi-Deok, Lee, Kyong-Taek, Choi, Won-Ho, Yang, Ji-Woon, Kang, Chang Yong, Harris, Rusty, Song, S.C., Kalra, Pankaj, Lee, Sehoon, Banerjee, Sanjay, Lee, Byoung Hun, TsYear:
2007
Language:
english
DOI:
10.1109/iwjt.2007.4279946
File:
PDF, 2.51 MB
english, 2007