High Rate Deposition of Microcrystalline Silicon Using...

Japanese Journal of Applied Physics 1998 / 10 Vol. 37; Iss. Part 2, No

High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

Guo, Lihui, Kondo, Michio, Fukawa, Makoto, Saitoh, Kimihiko, Matsuda, Akihisa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.L1116
Date:
October, 1998
File:
PDF, 101 KB
english, 1998
Conversion to is in progress
Conversion to is failed