Effect of a Two-Step Recess Process Using Atomic Layer...

Effect of a Two-Step Recess Process Using Atomic Layer Etching on the Performance of $\hbox{In}_{0.52}\hbox{Al}_{0.48}\hbox{As/In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ p-HEMTs

Kim, Tae-Woo, Kim, Dae-Hyun, Park, Sang Duk, Yeom, Geun Young, Lim, Byeong Ok, Rhee, Jin-Koo, Jang, Jae-Hyung, Song, Jong-In
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
28
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2007.910278
Date:
December, 2007
File:
PDF, 416 KB
english, 2007
Conversion to is in progress
Conversion to is failed