[IEEE 2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Munich, Germany (23-24 April 2001)] 2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) - Studies of high-k dielectrics deposited by liquid source misted chemical deposition in MOS gate structures
Ruzyllo, J., Lee, D.-O., Roman, P., Horn, M., Mumbauer, P., Brubaker, M., Grant, R.Year:
2001
Language:
english
DOI:
10.1109/asmc.2001.925619
File:
PDF, 351 KB
english, 2001