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Microelectromechanical HF resonators fabricated using a novel SOI-based low-temperature process
Ruther, P., Bartholomeyczik, J., Buhmann, A., Trautmann, A., Steffen, K., Paul, O.Volume:
5
Language:
english
Journal:
IEEE Sensors Journal
DOI:
10.1109/jsen.2005.851009
Date:
October, 2005
File:
PDF, 1.69 MB
english, 2005