[IEEE International Meeting for Future of Electron Devices,...

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[IEEE International Meeting for Future of Electron Devices, 2004. - Kyoto, Japan (July 26-28, 2004)] International Meeting for Future of Electron Devices, 2004. - Effect on the electrical properties of HfO/sub 2/ films grown by metal-organic molecular beam epitaxy

Mvouna-Seok Kim,, Young-Don Ko,, Tae-Hyoung Moon,, Min-Chang Jeong,, Myoung, J., Ilgu Yun,
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Year:
2004
Language:
english
DOI:
10.1109/imfedk.2004.1566416
File:
PDF, 1.32 MB
english, 2004
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