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Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering
Hong, R. J., Jiang, X., Sittinger, V., Szyszka, B., Höing, T., Bräuer, G., Heide, G., Frischat, G. H.Volume:
20
Year:
2002
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1472420
File:
PDF, 442 KB
english, 2002