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[IEEE 1994 VLSI Technology Symposium - Honolulu, HI, USA (7-9 June 1994)] Proceedings of 1994 VLSI Technology Symposium - ClF/sub 3/ gas compound for particle free contact hole etching
Imai, S., Tamaki, T., Okada, S., Kubota, M., Nomura, N.Year:
1994
Language:
english
DOI:
10.1109/vlsit.1994.324393
File:
PDF, 185 KB
english, 1994