[IEEE 2006 International Symposium on VLSI Technology, Systems, and Applications - Hsinchu, Taiwan (2006.4.24-2006.4.24)] 2006 International Symposium on VLSI Technology, Systems, and Applications - Strain-Induced Channel Backscattering Modulation in Nanoscale CMOSFETs
Chen, Hung-wei, Lin, Hong-nien, Ko, Chih-hsin, Ge, Chung-hu, Lin, Horng-chih, Huang, Tiao-yuan, Lee, Wen-chinYear:
2006
Language:
english
DOI:
10.1109/vtsa.2006.251067
File:
PDF, 2.70 MB
english, 2006