[Japan Soc. Applied Phys 2003 Symposium on VLSI Technology....

[Japan Soc. Applied Phys 2003 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (10-12 June 2003)] 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) - Strained silicon NMOS with nickel-silicide metal gate

Qi Xiang,, Jung-Suk Goo,, Pan, J., Bin Yu,, Ahmed, S., John Zhang,, Ming-Ren Lin,

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Year:

2003

Language:

english

DOI:

10.1109/vlsit.2003.1221106

File:

PDF, 198 KB

english, 2003

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