Calorimetric analysis of thin-film reactions: Experiments...

Journal of Applied Physics 1994 Vol. 76; Iss. 9

Calorimetric analysis of thin-film reactions: Experiments and modeling in the nickel/silicon system

Knauth, P., Charaï, A., Bergman, C., Gas, P.
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Volume:
76
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.357238
File:
PDF, 1.25 MB
english, 1994
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