[IEEE 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (4-6 May 2004)] 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530) - "Extreme edge engineering" - 2 mm edge exclusion challenges and cost-effective solutions for yield enhancement in high volume manufacturing for 200 and 300 mm wafer fabs
Tran, T., Roberts, W., Tiffany, J., Jekauc, I., Clements, N., Jowett, P., Ferguson, R., Mattson, D., Demmert, C., Richmond, M., Wiendl, C., Bruno, M., Brock, A., Taylor, T.Year:
2004
Language:
english
DOI:
10.1109/asmc.2004.1309614
File:
PDF, 596 KB
english, 2004