Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2001 Vol. 19; Iss. 6
Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography
Osawa, Morimi, Takahashi, Kimitoshi, Sato, Masami, Arimoto, Hiroshi, Ogino, Kozo, Hoshino, Hiromi, Machida, YasuhideVolume:
19
Year:
2001
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1410090
File:
PDF, 1015 KB
english, 2001