Smoothing mechanisms involved in thermal treatment for...

Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns

Pargon, Erwine, Azarnouche, Laurent, Fouchier, Marc, Menguelti, Kevin, Jussot, Julien
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4825238
File:
PDF, 2.75 MB
english, 2013
Conversion to is in progress
Conversion to is failed