Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
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Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns
Pargon, Erwine, Azarnouche, Laurent, Fouchier, Marc, Menguelti, Kevin, Jussot, JulienVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4825238
File:
PDF, 2.75 MB
english, 2013