Low-temperature (≤200 °C) plasma enhanced atomic layer...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2013 Vol. 31; Iss. 1

Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

Samal, Nigamananda, Du, Hui, Luberoff, Russell, Chetry, Krishna, Bubber, Randhir, Hayes, Alan, Devasahayam, Adrian
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Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4769204
File:
PDF, 1.95 MB
english, 2013
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