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Low filament temperature deposition of a-Si:H by hot-wire chemical vapor deposition
Brogueira, P., Conde, J. P., Arekat, S., Chu, V.Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.359957
File:
PDF, 1.21 MB
english, 1995