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Amorphous silicon layer characteristics during 70–2000 eV Ar[sup +]-ion bombardment of Si(100)
Stevens, A. A. E., Kessels, W. M. M., van de Sanden, M. C. M., Beijerinck, H. C. W.Volume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2244535
File:
PDF, 417 KB
english, 2006