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Nonalloyed ohmic mechanism of TiN interfacial layer in Ti/Al contacts to (NH[sub 4])[sub 2]S[sub x]-treated n-type GaN layers
Lee, Ching-Ting, Lin, Yow-Jon, Lin, Chun-HungVolume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1506383
File:
PDF, 321 KB
english, 2002