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Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization
Rajagopalan, T., Wang, X., Lahlouh, B., Ramkumar, C., Dutta, Partha, Gangopadhyay, S.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1609631
File:
PDF, 531 KB
english, 2003