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An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography
Hu, Xin, Huang, Shisong, Gu, Ronghua, Yuan, Changsheng, Ge, Haixiong, Chen, YanfengVolume:
35
Language:
english
Journal:
Macromolecular Rapid Communications
DOI:
10.1002/marc.201400251
Date:
October, 2014
File:
PDF, 1.53 MB
english, 2014