Low-defect-density and high-reliability FETMOS EEPROM's...

Low-defect-density and high-reliability FETMOS EEPROM's fabricated using furnace N/sub 2/O oxynitridation

Y. Kim, Y. Okada, K. Chang, P. Tobin, B. Morton, H. Choe, M. Bowers, C. Kuo, D. Chrudimsky, S. Ajuria, J. Yeargain

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Year:

1993

Language:

english

DOI:

10.1109/55.225567

File:

PDF, 273 KB

english, 1993

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