Device-quality copper using chemical vapor deposition of...

  • Main
  • Device-quality copper using chemical...

Device-quality copper using chemical vapor deposition of β-diketonate source precursors in liquid solution

B. Zheng, E. T. Eisenbraun, J. Liu, A. E. Kaloyeros
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
1992
Language:
english
DOI:
10.1063/1.108286
File:
PDF, 655 KB
english, 1992
Conversion to is in progress
Conversion to is failed