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Germanium-rich silicon-germanium films epitaxially grown by ultrahigh vacuum chemical-vapor deposition directly on silicon substrates
D. D. Cannon, J. Liu, D. T. Danielson, S. Jongthammanurak, U. U. Enuha, K. Wada, J. Michel, L. C. KimerlingYear:
2007
Language:
english
DOI:
10.1063/1.2825410
File:
PDF, 441 KB
english, 2007