[IEEE 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (12-14 Sept. 2000)] 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072) - 2-in-1 total process integration in MERIE etch chamber for Cu dual damascene applications
Wu, R., Zhang, L., Yang, J., Tsui, J., Jiang, A., Sun, J., Yuan, J., Hsieh, P., Hung, R., Ye, Y., Hsueh, G., Jyu-Horng Shieh,, Jen-Cheng Liu,, Chia-Shueng Tsai,Year:
2000
Language:
english
DOI:
10.1109/asmc.2000.902601
File:
PDF, 317 KB
english, 2000