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High aspect ratio SiO[sub 2] etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether
Y. Chinzei, Y. Feurprier, M. Ozawa, T. Kikuchi, K. Horioka, T. Ichiki, Y. HoriikeYear:
2000
Language:
english
DOI:
10.1116/1.582132
File:
PDF, 648 KB
english, 2000