Composition and resistivity changes of reactively sputtered W–Si–N thin films under vacuum annealing
A. Vomiero, E. Boscolo Marchi, G. Mariotto, A. Quaranta, G. Della Mea, G. Ottaviani, R. Tonini, M. Butturi, G. MartinelliYear:
2006
Language:
english
DOI:
10.1063/1.2166691
File:
PDF, 324 KB
english, 2006