Reverse annealing and low-temperature diffusion of boron in...

Reverse annealing and low-temperature diffusion of boron in boron-implanted silicon

Huang, J., Fan, D., Jaccodine, R. J.
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Volume:
63
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.340328
File:
PDF, 848 KB
english, 1988
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