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Pulsed plasma-enhanced chemical vapor deposition from CH[sub 2]F[sub 2], C[sub 2]H[sub 2]F[sub 4], and CHClF[sub 2]
Labelle, Catherine B., Gleason, Karen K.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581604
File:
PDF, 439 KB
english, 1999