Pulsed plasma-enhanced chemical vapor deposition from...

Pulsed plasma-enhanced chemical vapor deposition from CH[sub 2]F[sub 2], C[sub 2]H[sub 2]F[sub 4], and CHClF[sub 2]

Labelle, Catherine B., Gleason, Karen K.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581604
File:
PDF, 439 KB
english, 1999
Conversion to is in progress
Conversion to is failed