Patterned electrochemical deposition of copper using an electron beam
den Heijer, Mark, Shao, Ingrid, Radisic, Alex, Reuter, Mark C., Ross, Frances M.Volume:
2
Language:
english
Journal:
APL MATERIALS
DOI:
10.1063/1.4863596
Date:
February, 2014
File:
PDF, 1.22 MB
english, 2014