Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge...

Applied Surface Science 2014 / 12 Vol. 321

Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate

Maeng, Wan Joo, Oh, Il-Kwon, Kim, Woo-Hee, Kim, Min-Kyu, Lee, Chang-Wan, Lansalot-Matras, Clement, Thompson, David, Chu, Schubert, Kim, Hyungjun
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Volume:
321
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.10.025
Date:
December, 2014
File:
PDF, 715 KB
english, 2014
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