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[IEEE IEEE/CPMT/SEMI 29th International Electronics Manufacturing Technology Symposium - San Jose, CA, USA (14-16 July 2004)] IEEE/CPMT/SEMI 29th International Electronics Manufacturing Technology Symposium (IEEE Cat. No.04CH37585) - How can design for manufacturing improve mask cost and yield?
Cote, M., Hurat, P., Rieger, M., Miloslavsky, A., Goinard, D.Year:
2004
Language:
english
DOI:
10.1109/iemt.2004.1321675
File:
PDF, 402 KB
english, 2004