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Low-temperature synchrotron-radiation-excited etching of silicon dioxide with sulfur hexafluoride adsorption
Ogawa, Taro, Mochiji, Kozo, Ochiai, Isao, Yamamoto, Seiji, Tanaka, KenichiroVolume:
75
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.355921
File:
PDF, 921 KB
english, 1994