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An atomic model of the nitrous-oxide-nitrided SiO[sub 2]/Si interface
Kushida-Abdelghafar, Keiko, Watanabe, Kikuo, Kikawa, Takeshi, Kamigaki, Yoshiaki, Ushio, JiroVolume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1497720
File:
PDF, 547 KB
english, 2002