In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si:H films using real-time spectroscopic ellipsometry
Levi, D. H., Nelson, B. P., Perkins, J. D., Moutinho, H. R.Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1564037
File:
PDF, 462 KB
english, 2003