Reaction of iron and silicon during ion implantation

Journal of Applied Physics 1993 Vol. 73; Iss. 10

Reaction of iron and silicon during ion implantation

Crecelius, G., Radermacher, K., Dieker, Ch.
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Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.353800
File:
PDF, 856 KB
english, 1993
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