Penetration of fluorine into the silicon lattice during...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2007 Vol. 25; Iss. 1

Penetration of fluorine into the silicon lattice during exposure to F atoms, F[sub 2], and XeF[sub 2]: Implications for spontaneous etching reactions

Winters, Harold F., Graves, D. B., Humbird, D., Tougaard, Sven
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Volume:
25
Year:
2007
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2400680
File:
PDF, 1.31 MB
english, 2007
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