Low ion energy RF reactor using an array of plasmas through a grounded grid
Chesaux, Michaël, Howling, Alan A., Hollenstein, Christoph, Dominé, Didier, Kroll, UlrichVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4790423
File:
PDF, 2.90 MB
english, 2013